论文标题
量子异常绝缘子的环境掺杂引起的降解
Environmental Doping-Induced Degradation of the Quantum Anomalous Hall Insulators
论文作者
论文摘要
量子异常霍尔(QAH)绝缘子是一个拓扑量子状态,具有量化的霍尔电阻,在没有外部磁场的情况下零纵向电阻。 QAH绝缘子携带自旋偏振的无手性手性边缘电流,因此为开发节能的变革性信息技术提供了独特的机会。尽管在过去十年中取得了有希望的QAH效应的进步,但迄今为止,QAH绝缘子已经避免了任何实际应用。除了其低工作温度外,磁掺杂拓扑绝缘子(TI)膜/异质结构中的QAH状态通常在环境条件下随时间而恶化。在这项工作中,我们准备了具有相似初始属性的三个QAH设备,并将它们存储在不同的环境中,以研究其运输属性的演变。空气中没有保护层的QAH设备显示出明显的降解,并随着电荷中性点的孔掺杂,可显着转移到正门电压。 QAH设备保存在没有保护层的氩气手套箱中,没有可测量的降解,在空气中,由3 nm Alox保护层保护的设备显示,稳定的QAH属性显示最小的降解。我们的工作显示了一条途径,以保留QAH设备中无耗散的手性边缘状态,用于量子信息技术中的潜在应用。
The quantum anomalous Hall (QAH) insulator is a topological quantum state with quantized Hall resistance and zero longitudinal resistance in the absence of an external magnetic field. The QAH insulator carries spin-polarized dissipation-free chiral edge current and thus provides a unique opportunity to develop energy-efficient transformative information technology. Despite promising advances on the QAH effect over the past decade, the QAH insulator has thus far eluded any practical applications. In addition to its low working temperature, the QAH state in magnetically doped topological insulator (TI) films/heterostructures usually deteriorates with time in ambient conditions. In this work, we prepare three QAH devices with similar initial properties and store them in different environments to investigate the evolution of their transport properties. The QAH device without a protection layer in air show clear degradation and becomes hole-doped with the charge neutral point shifting significantly to positive gate voltages. The QAH device kept in an argon glove box without a protection layer shows no measurable degradation after 560 hours and the device protected by a 3 nm AlOx protection layer in air shows minimal degradation with stable QAH properties. Our work shows a route to preserve the dissipation-free chiral edge state in QAH devices for potential applications in quantum information technology.