论文标题

山谷剖面对过渡金属二分法的迁移率和kerr旋转的影响

The impact of valley profile on the mobility and Kerr rotation of transition metal dichalcogenides

论文作者

Sohier, Thibault, de Melo, Pedro M. M. C., Zanolli, Zeila, Verstraete, Matthieu Jean

论文摘要

半导体过渡金属二进制基因在室温周围的传输和光学性质由复合物,自旋纹理和多谷电子景观中的电子播种机构决定。山谷的相对位置至关重要,但它们对外部参数很敏感,并且很难直接确定。我们提出了一个原则模型作为功能谷位置,以计算载体迁移率和Kerr旋转角度。该模型带来了有价值的见解,以及对宏观载体密度的宏观特性的定量预测。兴奋剂依赖的迁移率显示出一个特征峰,其高度取决于山谷的位置。当相同的旋转阀对齐时,Kerr旋转信号会增强,并在群体相反的旋转效果时淬火。我们提供了针对实验参数优化这些数量的准则,以及对\ emph {int intu {原位表征的理论支持。

The transport and optical properties of semiconducting transition metal dichalcogenides around room temperature are dictated by electron-phonon scattering mechanisms within a complex, spin-textured and multi-valley electronic landscape. The relative positions of the valleys are critical, yet they are sensitive to external parameters and very difficult to determine directly. We propose a first-principle model as a function valley positions to calculate carrier mobility and Kerr rotation angles. The model brings valuable insights, as well as quantitative predictions of macroscopic properties for a wide range of carrier density. The doping-dependant mobility displays a characteristic peak, the height depending on the position of the valleys. The Kerr rotation signal is enhanced when same spin-valleys are aligned, and quenched when opposite spin-valleys are populated. We provide guidelines to optimize these quantities with respect to experimental parameters, as well as the theoretical support for \emph{in situ} characterization of the valley positions.

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